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Effect of H2on residual impurities in GaAs MBE layers

 

作者: A. R. Calawa,  

 

期刊: Applied Physics Letters  (AIP Available online 1978)
卷期: Volume 33, issue 12  

页码: 1020-1022

 

ISSN:0003-6951

 

年代: 1978

 

DOI:10.1063/1.90246

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The introduction of hydrogen during the MBE growth of GaAs is shown to produce a major improvement in the electrical properties of the epitaxial layers. The observed increase in 77 K electron mobilities reflects a significant decrease in total ionized impurity concentration. Evidence is presented that the dominant residual impurities in MBE‐grown GaAs are oxygen and carbon.

 

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