Elastic and Anelastic Behavior of Ion‐Implanted Silicon
作者:
S. I. Tan,
B. S. Berry,
B. L. Crowder,
期刊:
Applied Physics Letters
(AIP Available online 1972)
卷期:
Volume 20,
issue 2
页码: 88-90
ISSN:0003-6951
年代: 1972
DOI:10.1063/1.1654060
出版商: AIP
数据来源: AIP
摘要:
Ion‐implantation damage has been studied in thin reeds of silicon by resonant‐frequency and internal‐friction measurements. For a dose of 1016/cm2of28Si+, the principal effects are the appearance of an internal‐friction peak and a decrease in the flexural vibration frequencies. The amorphous surface layer produced by implantation is deduced to have a Young's modulus of 1.24×1012dyn/cm2and a density of 0.95 of the crystal density. The internal stress in the amorphous layer has been measured and found to be far smaller than that corresponding to a purely elastic accommodation of the density change.
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