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Pressure dependence of the deep level associated with oxygen inn‐GaAs

 

作者: A. Zylbersztejn,   R. H. Wallis,   J. M. Besson,  

 

期刊: Applied Physics Letters  (AIP Available online 1978)
卷期: Volume 32, issue 11  

页码: 764-766

 

ISSN:0003-6951

 

年代: 1978

 

DOI:10.1063/1.89887

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Transient capacitance measurements have been performed on Schottky barriers onn‐GaAs containing the deep electron trap associated with oxygen, as a function of hydrostatic pressure. It is found that the oxygen level separates from the conduction band at a linear rate of 3.8±0.3 meV/kbar. From a comparison with published optical data we conclude that most of this variation comes from a pressure‐dependent Frank‐Condon shift and that the unoccupied level separates very little from the valence band.

 

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