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Low‐temperature refractory metal film deposition

 

作者: R. Solanki,   P. K. Boyer,   G. J. Collins,  

 

期刊: Applied Physics Letters  （AIP Available online 1982）
卷期: Volume 41, issue 11  

页码: 1048-1050

 

ISSN:0003-6951

 

年代: 1982

 

DOI:10.1063/1.93389

 

出版商: AIP

 

数据来源: AIP

 

摘要:

We have deposited uniform films of Mo, W, and Cr over large areas (>5 cm2) using UV laser photodissociation of their respective hexacarbonyls. The depositions were made at room temperature over pyrex and quartz plates, as well as silicon wafers. We have examined the resistivity, reflectivity, stress, and step coverage of these films.

 

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