Orientation effect of self‐aligned source/drain planar GaAs Schottky barrier field‐effect transistors
作者:
N. Yokoyama,
H. Onodera,
T. Ohnishi,
A. Shibatomi,
期刊:
Applied Physics Letters
(AIP Available online 1983)
卷期:
Volume 42,
issue 3
页码: 270-271
ISSN:0003-6951
年代: 1983
DOI:10.1063/1.93911
出版商: AIP
数据来源: AIP
摘要:
The effect of orientation on self‐aligned source/drain planar GaAs Schottky barrier field‐effect transistors (FET’s) has been investigated. The dependence of the threshold voltage of FET’s on gate length was measured for FET’s oriented in two perpendicular [110] directions. Both stress‐enhanced lateral spread of implanted ions and lateral diffusion at the gate material/GaAs interface are proposed as possible mechanism to account for the orientation effect. The experiments indicate that the preferred direction for the self‐aligned FET fabrication on a (100) substrate is [011¯].
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