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Simulation of structural anisotropy and void formation in amorphous thin films

 

作者: D. Henderson,   M. H. Brodsky,   P. Chaudhari,  

 

期刊: Applied Physics Letters  （AIP Available online 1974）
卷期: Volume 25, issue 11  

页码: 641-643

 

ISSN:0003-6951

 

年代: 1974

 

DOI:10.1063/1.1655341

 

出版商: AIP

 

数据来源: AIP

 

摘要:

We have computer simulated the structure of thin amorphous films grown from a vapor. Our hard‐sphere model shows that structural anisotropy and voids are a natural occurrence of the deposition process. The amount of unfilled space (voids) and the anisotropy have been studied as a function of the angle of incidence of the vapor stream upon the substrate.

 

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