首页   按字顺浏览 期刊浏览 卷期浏览 Increased Resistance to Photodegradation of Rhodamine 6G in Cooled Solid Matrices
Increased Resistance to Photodegradation of Rhodamine 6G in Cooled Solid Matrices

 

作者: R. L. Fork,   Z. Kaplan,  

 

期刊: Applied Physics Letters  （AIP Available online 1972）
卷期: Volume 20, issue 12  

页码: 472-474

 

ISSN:0003-6951

 

年代: 1972

 

DOI:10.1063/1.1654021

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Improved resistance to photodegradation for Rhodamine 6G was observed when the dye was held in a cooled solid matrix of polymethylmethacrylate. The fraction of dye bleached decreased with decreasing temperature as did the rate of bleaching. The minimum detectable quantum efficiency for photodegradation was &jgr; ≅ 10−7.

 

点击下载:  PDF (262KB)



返 回