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Modeling effects of cesium vapor injection in a volume H−ion source

 

作者: O. Fukumasa,   H. Naitou,   T. Tanebe,  

 

期刊: AIP Conference Proceedings  (AIP Available online 1992)
卷期: Volume 287, issue 1  

页码: 117-129

 

ISSN:0094-243X

 

年代: 1992

 

DOI:10.1063/1.44777

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Effects of cesium vapor injection on H−production in a tandem source are studied theoretically by solving a set of particle balance equations in a steady‐state hydrogen plasma. In particular, enhancement of H−production and its mechanism, effects of wall recombination of H for surface H−production, and the effectiveness of the tandem two‐chamber system for H−optimization are discussed.

 

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