Modeling effects of cesium vapor injection in a volume H−ion source
作者:
O. Fukumasa,
H. Naitou,
T. Tanebe,
期刊:
AIP Conference Proceedings
(AIP Available online 1992)
卷期:
Volume 287,
issue 1
页码: 117-129
ISSN:0094-243X
年代: 1992
DOI:10.1063/1.44777
出版商: AIP
数据来源: AIP
摘要:
Effects of cesium vapor injection on H−production in a tandem source are studied theoretically by solving a set of particle balance equations in a steady‐state hydrogen plasma. In particular, enhancement of H−production and its mechanism, effects of wall recombination of H for surface H−production, and the effectiveness of the tandem two‐chamber system for H−optimization are discussed.
点击下载:
PDF
(548KB)
返 回