New fabrication process for Josephson tunnel junctions with (niobium nitride, niobium) double‐layered electrodes
作者:
Akira Shoji,
Fujitoshi Shinoki,
Shin Kosaka,
Masahiro Aoyagi,
Hisao Hayakawa,
期刊:
Applied Physics Letters
(AIP Available online 1982)
卷期:
Volume 41,
issue 11
页码: 1097-1099
ISSN:0003-6951
年代: 1982
DOI:10.1063/1.93378
出版商: AIP
数据来源: AIP
摘要:
All hard Josephson tunnel junctions, whose base and counter electrodes are composed of double‐layered niobium nitride (NbN) and niobium (Nb) films, have been successfully fabricated by isolating a junction sandwich formed on a whole silicon wafer with a reactive ion etching technique. The reactive ion etching technique has been used for patterning both base and counterelectrodes, and self‐aligning definition of junction areas has been performed. The fabricated junctions show good quality single‐particle tunneling characteristics and excellent uniformity in critical currents.
点击下载:
PDF
(172KB)
返 回