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Influence of carrier diffusion on the intrinsic response time of semiconductor avalanches

 

作者: R. Hulin,   J.J. Goedbloed,  

 

期刊: Applied Physics Letters  (AIP Available online 1972)
卷期: Volume 21, issue 2  

页码: 69-71

 

ISSN:0003-6951

 

年代: 1972

 

DOI:10.1063/1.1654283

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The intrinsic response time &tgr;iof semiconductor avalanches has been determined from microwave measurements on Si, Ge, and GaAs IMPATT diodes of various structures (n+‐p, p+‐n, Schottky barrier). A theory has been developed to calculate &tgr;ifor these diodes. It was found that the effect of carrier diffusion has to be taken into account to remove a systematic discrepancy between experimental and theoretical values of &tgr;i. For Si the value of the average high‐field diffusion constantD¯=80 cm2/sec forE=400 kV/cm, taken from the literature, could be used satisfactorily. For Ge and GaAs, where no information onD¯is available,D¯=100 cm2/sec forE=200 kV/cm andD¯=250 cm2/sec forE=400 kV/cm, respectively, had to be chosen to explain the experimental values of &tgr;i.

 

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