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Negative‐ion plasma sources

 

作者: D. P. Sheehan,   N. Rynn,  

 

期刊: Review of Scientific Instruments  (AIP Available online 1988)
卷期: Volume 59, issue 8  

页码: 1369-1375

 

ISSN:0034-6748

 

年代: 1988

 

DOI:10.1063/1.1139671

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Three designs for negative‐ion plasma sources are described. Two sources utilize metal hexafluorides such as SF6and WF6to scavenge electrons from electron‐ion plasmas and the third relies upon surface ionization of alkali halide salts on heated alumina and zirconia. SF6introduced into electron‐ion plasmas yielded negative‐ion plasma densities of 1010cm−3with low residual electron densities, (ne/ni∼0.01–0.05). On alumina, plasma densities of 5×109cm−3were obtained for CsCl, CsI, and KI and 109cm−3for KCl. On zirconia 1010cm−3densities were obtained for CsCl. For alkali halide sources, electron densities ofne/ni≲10−4have been achieved.

 

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