Densities of amorphous Si films by nuclear backscattering
作者:
M.H. Brodsky,
D. Kaplan,
J.F. Ziegler,
期刊:
Applied Physics Letters
(AIP Available online 1972)
卷期:
Volume 21,
issue 7
页码: 305-307
ISSN:0003-6951
年代: 1972
DOI:10.1063/1.1654388
出版商: AIP
数据来源: AIP
摘要:
The backscattering of 2500‐keV alpha particles is used to measure the densities of amorphous Si films. The density of amorphous Si is found to be inversely proportional to the electron spin resonance signals. The extrapolated density at zero spins is equal to 1.01 ± 0.02 times that of crystalline Si. The highest density achieved in a real amorphous film was 0.97 ± 0.02 times the crystalline density.
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