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Electron‐Emission Images on LiF After Exposure to Intense Laser Light

 

作者: P. Bra¨unlich,  

 

期刊: Applied Physics Letters  (AIP Available online 1972)
卷期: Volume 20, issue 1  

页码: 4-6

 

ISSN:0003-6951

 

年代: 1972

 

DOI:10.1063/1.1653972

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The observation of thermally stimulated emission of low‐energy electrons (TSEE) from LiF single crystals that had been subjected to intense pulses of light from a Nd‐glass laser is reported. TSEE images of the surface are obtained with the aid of an array of Channeltron electron multipliers. Correlations between image features and laser surface damage have been discovered that suggest the utilization of the TSEE image technique for nondestructive testing of optical surfaces with respect to their laser surface‐damage threshold.

 

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