首页   按字顺浏览 期刊浏览 卷期浏览 Development of a double plasma type negative ion source
Development of a double plasma type negative ion source

 

作者: Osamu Fukumasa,   Toshio Iwasaki,  

 

期刊: AIP Conference Proceedings  (AIP Available online 1992)
卷期: Volume 287, issue 1  

页码: 411-421

 

ISSN:0094-243X

 

年代: 1992

 

DOI:10.1063/1.44750

 

出版商: AIP

 

数据来源: AIP

 

摘要:

We have newly designed a double plasma type negative ion source, where energy distribution of fast electrons is well controlled by changing potential difference between two chambers. With the use of this source, pure H−volume production is studied experimentally. In particular, the effect of fast electrons on H−production (i.e., energy dependence of H−production) is discussed, and preliminary results support qualitatively the two‐step process of H−production.

 

点击下载:  PDF (322KB)



返 回