Development of a double plasma type negative ion source
作者:
Osamu Fukumasa,
Toshio Iwasaki,
期刊:
AIP Conference Proceedings
(AIP Available online 1992)
卷期:
Volume 287,
issue 1
页码: 411-421
ISSN:0094-243X
年代: 1992
DOI:10.1063/1.44750
出版商: AIP
数据来源: AIP
摘要:
We have newly designed a double plasma type negative ion source, where energy distribution of fast electrons is well controlled by changing potential difference between two chambers. With the use of this source, pure H−volume production is studied experimentally. In particular, the effect of fast electrons on H−production (i.e., energy dependence of H−production) is discussed, and preliminary results support qualitatively the two‐step process of H−production.
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