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Simulation of relationships between substrate XRF intensities and film thicknesses

 

作者: Qinmin Fan,  

 

期刊: X‐Ray Spectrometry  （WILEY Available online 1993）
卷期: Volume 22, issue 1  

页码: 11-12

 

ISSN:0049-8246

 

年代: 1993

 

DOI:10.1002/xrs.1300220104

 

出版商: Wiley Subscription Services, Inc., A Wiley Company

 

数据来源: WILEY

 

摘要:

AbstractA Monte Carlo method was used to simulate relationships between substrate XRF intensities and film thicknesses for nickel film– and tin film–substrate systems. Experimental measurements of these relationships were performed for a few film–substrate systems. Good agreement between simulated and experimental values was obt

 

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