Evaluation of the gas puffzpinch as an x‐ray lithography and microscopy source
作者:
J. Bailey,
Y. Ettinger,
A. Fisher,
R. Feder,
期刊:
Applied Physics Letters
(AIP Available online 1982)
卷期:
Volume 40,
issue 1
页码: 33-35
ISSN:0003-6951
年代: 1982
DOI:10.1063/1.92908
出版商: AIP
数据来源: AIP
摘要:
Soft x rays (100–10 000 eV), due to their short wavelength (0.1–10 nm) can play an important role in high resolution microscopy and lithography. The gas puffZpinch is an intense source of soft x rays. Calorimeter and x ray diode measurements showed that 10% of the stored electrical energy was converted to radiation in the range of 1–10 nm. Commercial photoresist polymethyl methacrylate (PMMA) and some new resists—CR 39, nitrocellulose, were exposed to the pinch radiation. The developed images on the resists have been studied with a scanning electron microscope. The resolution was found to be source limited, but a simple modification can improve the resolution by more than an order of magnitude.
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