A discharge technique based on the use of an electron‐beam‐induced plasma return current to produce and heat large‐volume plasmas is described. The results of discharge studies using this technique in attachment‐dominated mixtures are presented. The results are found to be adequately described by a simple theory. The electron attachment rate by F2inferred from these measurements agrees well with those of other workers. KrF laser action at 248 nm is reported in return‐current discharge‐excited mixtures of F2/Kr/He.