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200‐MHz electrodeless discharge excitation of an XeF laser

 

作者: C. P. Christensen,   R. W. Waynant,  

 

期刊: Applied Physics Letters  （AIP Available online 1982）
卷期: Volume 41, issue 9  

页码: 794-796

 

ISSN:0003-6951

 

年代: 1982

 

DOI:10.1063/1.93706

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Two hundred megahertz electrodeless rf discharge excitation of an XeF laser is reported. Laser output of total duration exceeding 300 ns is observed. Onset of discharge inhomogeneity is found to limit duration of the laser pulse and to influence recovery of the active medium.

 

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