Factors Affecting the Growth of Siloxane Films on Metal Substrates
作者:
AlanE. Jemmett,
期刊:
A S L E Transactions
(Taylor Available online 1973)
卷期:
Volume 16,
issue 3
页码: 233-238
ISSN:0569-8197
年代: 1973
DOI:10.1080/05698197308982727
出版商: Taylor & Francis Group
数据来源: Taylor
摘要:
This work examines the evidence for the existence of viable films of siloxanes an metal surfaces, shows the occurrence of two different types of film; and examines the chemistry of one of these films in detail. The measurement of relative film thicknesses by attenuated total reflectance infrared techniques is demonstrated and a mode of film growth is postulated. The effect of temperature and static charge on film growth characteristics is noted and is shown to be in accord with the postulated mechanism of film growth.Presented as on American Society of Lubrication Engineers paper at the ASME/ASLE International Lubrication Conference held in New York City, October 9–12, 1972
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