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Factors Affecting the Growth of Siloxane Films on Metal Substrates

 

作者: AlanE. Jemmett,  

 

期刊: A S L E Transactions  (Taylor Available online 1973)
卷期: Volume 16, issue 3  

页码: 233-238

 

ISSN:0569-8197

 

年代: 1973

 

DOI:10.1080/05698197308982727

 

出版商: Taylor & Francis Group

 

数据来源: Taylor

 

摘要:

This work examines the evidence for the existence of viable films of siloxanes an metal surfaces, shows the occurrence of two different types of film; and examines the chemistry of one of these films in detail. The measurement of relative film thicknesses by attenuated total reflectance infrared techniques is demonstrated and a mode of film growth is postulated. The effect of temperature and static charge on film growth characteristics is noted and is shown to be in accord with the postulated mechanism of film growth.Presented as on American Society of Lubrication Engineers paper at the ASME/ASLE International Lubrication Conference held in New York City, October 9–12, 1972

 

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