Diffuse x‐ray scattering from small defects in a very perfect silicon single crystal
作者:
Jimpei Harada,
Katsuei Wakamatsu,
Shigeru Yasuami,
期刊:
Applied Physics Letters
(AIP Available online 1978)
卷期:
Volume 32,
issue 5
页码: 271-272
ISSN:0003-6951
年代: 1978
DOI:10.1063/1.90044
出版商: AIP
数据来源: AIP
摘要:
Two kinds of diffuse x‐ray scattering were found in a very perfect silicon single crystal. One of them forms a cigar shape, extending along the [111] direction. The other is a disk shape whose normal is also parallel to the [111] direction in reciprocal space. Both diffuse scatterings are predominant along the crystal pulling [111] direction. From simple Fourier inversion of the shapes of the diffuse scatterings, it is concluded that the platelike defects and needlelike defects are the origins of the diffuse scatterings. The platelike defects observed differ from those observed by Patel for Czochralski silicon with heat treatment.
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