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Intense electron‐beam pinch formation and propagation in rod pinch diodes

 

作者: R. A. Mahaffey,   J. Golden,   Shyke A. Goldstein,   G. Cooperstein,  

 

期刊: Applied Physics Letters  （AIP Available online 1978）
卷期: Volume 33, issue 9  

页码: 795-797

 

ISSN:0003-6951

 

年代: 1978

 

DOI:10.1063/1.90550

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Intense electron‐beam pinches are formed and propagated at relatively high impedance (5–25 &OHgr;) using rod pinch diodes. Pinch propagation of up to 20 cm with 45% efficiency and ion‐generation efficiency ≳15% has been observed.

 

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