High‐quality ZnSe thin films grown by molecular beam epitaxy
作者:
Takafumi Yao,
Mutsuo Ogura,
Seiji Matsuoka,
Toshihide Morishita,
期刊:
Applied Physics Letters
(AIP Available online 1983)
卷期:
Volume 43,
issue 5
页码: 499-501
ISSN:0003-6951
年代: 1983
DOI:10.1063/1.94366
出版商: AIP
数据来源: AIP
摘要:
High‐quality, nominally undoped, low‐resistivity ZnSe thin films are grown by molecular beam epitaxy (MBE). The MBE ZnSe shows the largest peak intensity ratio of the near‐band‐edge emission to the deep center luminescence even at room temperature compared with other epitaxial techniques, which indicates the smallest concentration of complex defects in the MBE ZnSe. From the temperature dependence of electron mobility for MBE ZnSe, we obtained the mobility value as high as 6.9×103cm2/Vs. This is the highest value ever obtained in epitaxial ZnSe films and indicates the concentration of isolated charged defects as low as 1×1016cm−3.
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