Mass and energy dependence of the equilibrium surface composition of sputtered tantalum oxide
作者:
E. Taglauer,
W. Heiland,
期刊:
Applied Physics Letters
(AIP Available online 1978)
卷期:
Volume 33,
issue 11
页码: 950-952
ISSN:0003-6951
年代: 1978
DOI:10.1063/1.90230
出版商: AIP
数据来源: AIP
摘要:
Anodically oxidized Ta2O5surfaces were sputtered with 300–1800‐eV He+and Ar+ions. The surface composition was measured with AES and ISS. The results clearly show that the equilibrium surface composition depends on mass and energy of the primary ions. This composition is reversible for different masses or energies. A short discussion of these effects is given, including the characteristic fluence for obtaining equilibrium.
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