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Mass and energy dependence of the equilibrium surface composition of sputtered tantalum oxide

 

作者: E. Taglauer,   W. Heiland,  

 

期刊: Applied Physics Letters  (AIP Available online 1978)
卷期: Volume 33, issue 11  

页码: 950-952

 

ISSN:0003-6951

 

年代: 1978

 

DOI:10.1063/1.90230

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Anodically oxidized Ta2O5surfaces were sputtered with 300–1800‐eV He+and Ar+ions. The surface composition was measured with AES and ISS. The results clearly show that the equilibrium surface composition depends on mass and energy of the primary ions. This composition is reversible for different masses or energies. A short discussion of these effects is given, including the characteristic fluence for obtaining equilibrium.

 

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