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Microwave discharge atom source for chemical lasers

 

作者: R. A. McFarlane,  

 

期刊: Review of Scientific Instruments  （AIP Available online 1975）
卷期: Volume 46, issue 8  

页码: 1063-1065

 

ISSN:0034-6748

 

年代: 1975

 

DOI:10.1063/1.1134395

 

出版商: AIP

 

数据来源: AIP

 

摘要:

A high‐power, cw microwave magnetron is used to produce a discharge in a gas column flowing at high velocity. The large atom production rate obtained makes this a valuable atom source for chemical laser application.

 

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