首页   按字顺浏览 期刊浏览 卷期浏览 Photolysis of KI/Xe mixtures at 193 nm: Observation of KXe* emission
Photolysis of KI/Xe mixtures at 193 nm: Observation of KXe* emission

 

作者: A. M. Schilowitz,   J. R. Wiesenfeld,  

 

期刊: Applied Physics Letters  (AIP Available online 1983)
卷期: Volume 42, issue 3  

页码: 213-215

 

ISSN:0003-6951

 

年代: 1983

 

DOI:10.1063/1.93895

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Photodissociation of KI at 193 nm in the presence of Xe yields excimer emission in the region 410–530 nm. The intensity distribution differs dramatically from that observed following direct pumping, K (5 2 P)←K (4 2 S), the green emission being significantly weaker than that reported previously. Also, the rate of K(5 2 P) deactivation upon collision with Xe is quite inefficient,k<10−13cm3molecule−1s−1. A simple mechanism involving a curve crossing in KXe resulting in efficient quenching of K (5 2 P) to K(5 2 S) is not supported.

 

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