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An Electrodiffusion Apparatus for Solid Semiconductors

 

作者: David H. Laananen,   Welville B. Nowak,  

 

期刊: Review of Scientific Instruments  （AIP Available online 1969）
卷期: Volume 40, issue 3  

页码: 422-424

 

ISSN:0034-6748

 

年代: 1969

 

DOI:10.1063/1.1683963

 

出版商: AIP

 

数据来源: AIP

 

摘要:

An apparatus has been developed for the study of the influence of applied electric fields and currents on solid state diffusion of impurities in semiconductors. Special features of the apparatus are simple procedures, versatility, and allowance for determination of impurity profiles.

 

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