A NEW MACHINE FOR COMBINED VAPOUR DEPOSITION AND ION IMPLANTATION
作者:
L. Guzman,
期刊:
Advanced Materials and Manufacturing Processes
(Taylor Available online 1988)
卷期:
Volume 3,
issue 2
页码: 279-289
ISSN:0898-2090
年代: 1988
DOI:10.1080/10426918808953207
出版商: Taylor & Francis Group
数据来源: Taylor
摘要:
A low energy ion implanter has been adequately modified in order to perform reactive ion beam enhanced deposition (RIBED) and dynamic recoil ion mixing experiments under controlled conditions in a high vacuum environment (better than 10-5Pa). The machine consists of a Duoplasmatron ion source, a mass analyzer, a target chamber adaptable for use with various samples, and a 2 crucible electron gun evaporator equipped with film thickness monitor
点击下载:
PDF (221KB)
返 回