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Platinum silicide‐aluminum Schottky diode characteristics

 

作者: H.H. Hosack,  

 

期刊: Applied Physics Letters  (AIP Available online 1972)
卷期: Volume 21, issue 6  

页码: 256-257

 

ISSN:0003-6951

 

年代: 1972

 

DOI:10.1063/1.1654367

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The effects of heat treatment on platinum silicide Schottky diodes with aluminum metal contacts have been investigated. It has been found that the aluminum reacts with the silicide causing a change in the effective metal‐semiconductor barrier height over a range of approximately 0.25 eV. Schottky diodes with initial platinum silicide characteristics convert to devices with barrier heights characteristic of aluminum after extended heat treatments.

 

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