首页   按字顺浏览 期刊浏览 卷期浏览 Electron‐beam‐controlled discharge XeCl excimer laser
Electron‐beam‐controlled discharge XeCl excimer laser

 

作者: Jeffrey I. Levatter,   James H. Morris,   Shao‐Chi Lin,  

 

期刊: Applied Physics Letters  (AIP Available online 1978)
卷期: Volume 32, issue 10  

页码: 630-632

 

ISSN:0003-6951

 

年代: 1978

 

DOI:10.1063/1.89874

 

出版商: AIP

 

数据来源: AIP

 

摘要:

A large‐volume (6‐liter) electron‐beam‐controlled discharge of about 1 &mgr;sec duration in a Xe/Ar mixture with HCl as the chlorine donor has been utilized to achieve efficient XeCl laser generation at 3080 A˚. At a fixed gas pressure and e‐beam current, the laser output is found to increase rapidly with the initial sustainer field strength up to the spontaneous breakdown limit. Near such a limit, a factor‐of‐25 enhancement of the XeCl laser output energy over that due to e‐beam pumping alone has been observed at 1 atm total pressure. The specific output pulse energy density and laser efficiency based on total energy deposition, of 0.5 J/liter atm and 0.7%, respectively, are beginning to approach the best values reported in the literature for the XeF and KrF lasers.

 

点击下载:  PDF (266KB)



返 回