Electron‐beam‐controlled discharge XeCl excimer laser
作者:
Jeffrey I. Levatter,
James H. Morris,
Shao‐Chi Lin,
期刊:
Applied Physics Letters
(AIP Available online 1978)
卷期:
Volume 32,
issue 10
页码: 630-632
ISSN:0003-6951
年代: 1978
DOI:10.1063/1.89874
出版商: AIP
数据来源: AIP
摘要:
A large‐volume (6‐liter) electron‐beam‐controlled discharge of about 1 &mgr;sec duration in a Xe/Ar mixture with HCl as the chlorine donor has been utilized to achieve efficient XeCl laser generation at 3080 A˚. At a fixed gas pressure and e‐beam current, the laser output is found to increase rapidly with the initial sustainer field strength up to the spontaneous breakdown limit. Near such a limit, a factor‐of‐25 enhancement of the XeCl laser output energy over that due to e‐beam pumping alone has been observed at 1 atm total pressure. The specific output pulse energy density and laser efficiency based on total energy deposition, of 0.5 J/liter atm and 0.7%, respectively, are beginning to approach the best values reported in the literature for the XeF and KrF lasers.
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