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First-order parameter extraction on enhancement silicon MOS transistors

 

作者: M.F.Hamer,  

 

期刊: IEE Proceedings I (Solid-State and Electron Devices)  (IET Available online 1986)
卷期: Volume 133, issue 2  

页码: 49-54

 

年代: 1986

 

DOI:10.1049/ip-i-1.1986.0011

 

出版商: IEE

 

数据来源: IET

 

摘要:

A novel transformation technique has been devised which enables the rapid evaluation of the key MOS transistor parameters, threshold voltage, gain and mobility degradation factor without recourse to the inaccurate compromise approaches previously used. In the paper, the previous methods are reviewed to highlight the errors which can occur, and then the new technique detailed. Extensions to the technique are discussed to enable three of the global parameters to be determined. Finally, a test block is described which is suitable for the parameter extraction routine developed.

 

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