首页   按字顺浏览 期刊浏览 卷期浏览 Depth distribution of implanted helium and other low‐zelements in metal films us...
Depth distribution of implanted helium and other low‐zelements in metal films using proton backscattering

 

作者: Robert S. Blewer,  

 

期刊: Applied Physics Letters  (AIP Available online 1973)
卷期: Volume 23, issue 11  

页码: 593-595

 

ISSN:0003-6951

 

年代: 1973

 

DOI:10.1063/1.1654759

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The depth profiles of helium implanted into copper foils have been observed experimentally by a proton backscattering technique. Carbon and oxygen on the front and rear surfaces of the foils have also been resolved. The mean depth of the helium implanted at 50, 100, and 150 keV is in agreement with projected range calculations, though the rms spread in the distributions is smaller than predicted. The shape of the profiles is the Gaussian form expected from single energy implants with no evidence of tails extending deep into the foils. Detection sensitivity is greater than 1 at.% for He in Cu under the experimental conditions investigated. The mean depth (peak) of the implanted helium distributions can be determined to within ± 100 Å.

 

点击下载:  PDF (229KB)



返 回