A series of Nb&sngbnd;Ti&sngbnd;N films have been prepared, with various Nb/Ti ratios, by a high purity, reactive sputtering process. A maximum in transition temperature (at ∼ 15.5°K) has been obtained for a composition ofNb0.5Ti0.5N. Critical field and critical current measurements indicate a degradation in these properties with increasing titanium content, contrary to results reported previously.