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Range and Energy Deposition Enhancement of a Fast Electron Beam by External Electric Fields

 

作者: C. M. Bowden,   J. F. Perkins,   R. A. Shatas,  

 

期刊: Journal of Vacuum Science and Technology  (AIP Available online 1973)
卷期: Volume 10, issue 6  

页码: 1000-1004

 

ISSN:0022-5355

 

年代: 1973

 

DOI:10.1116/1.1318452

 

出版商: American Vacuum Society

 

数据来源: AIP

 

摘要:

The electrode configuration in electron-beam preionized electrical discharge pumped molecular gas lasers can be arranged such that the drift field of the pump accelerates the fast electrons which are concurrently scattered. In designing lasers with output pulses beyond the kJ energy level, one uses the drift field to extend the range and to enhance the energy deposition of the fast electron beam. Although scattering and energy loss of electrons penetrating into matter without an external field is well known, electrical fields of the order ofkV cm−1at atmospheric pressures substantially affect both the range and the energy deposition of the primaries. We report numerical results in range and differential and integral energy deposition enhancement for 100 keV to 2 MeV electron beams in external fields up to10−16 V cm2electric field to number density (ε/N) ratio, forZeff=6gas mixtures obtained byMonte Carlocalculations of transport of fast electrons in thick absorbers modified to include the effects of an external electrical field applied across the scatterer. Detailed results are given in the form of graphs directly usable by the designer.

 

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