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Ion bombardment fabrication of optical waveguides using electron resist masks

 

作者: J.E. Goell,   R.D. Standley,   W.M. Gibson,   J.W. Rodgers,  

 

期刊: Applied Physics Letters  （AIP Available online 1972）
卷期: Volume 21, issue 2  

页码: 72-73

 

ISSN:0003-6951

 

年代: 1972

 

DOI:10.1063/1.1654284

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Fabrication of a circular strip waveguide by ion implantation of fused silica through a mask made by electron‐beam exposure of polymethylmethacrylate (PMMA) is described. This technique has an advantage in its simplicity and the small number of processing steps involved. Guidance of 0.6328‐&mgr;m light from a He&sngbnd;Ne laser through the guide is demonstrated.

 

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