Photopumped laser operation of MO‐CVD AlxGa1−xAs near a GaAs quantum well (&lgr;≳6200 A˚, 77 °K)
作者:
R. D. Dupuis,
P. D. Dapkus,
R. M. Kolbas,
N. Holonyak,
H. Shichijo,
期刊:
Applied Physics Letters
(AIP Available online 1978)
卷期:
Volume 33,
issue 7
页码: 596-598
ISSN:0003-6951
年代: 1978
DOI:10.1063/1.90473
出版商: AIP
数据来源: AIP
摘要:
Data are presented showing that AlxGa1−xAs (x∼0.42) grown by metalorganic chemical vapor deposition (MO‐CVD) will operate as a photopumped laser to wavelengths as short as ∼6200 A˚ (77 °K). From the different spectral behavior of two separately photopumped epitaxial AlxGa1−xAs (x∼0.36) confining layers (1 and 0.3 &mgr;m thick) with an 80‐A˚ (and a comparison 200‐A˚) GaAs quantum‐well center layer, the recombination of hot electrons with holes collected in the quantum layer is used to estimate &Dgr;Ev.
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