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Photopumped laser operation of MO‐CVD AlxGa1−xAs near a GaAs quantum well (&lgr;≳6200 A˚, 77 °K)

 

作者: R. D. Dupuis,   P. D. Dapkus,   R. M. Kolbas,   N. Holonyak,   H. Shichijo,  

 

期刊: Applied Physics Letters  (AIP Available online 1978)
卷期: Volume 33, issue 7  

页码: 596-598

 

ISSN:0003-6951

 

年代: 1978

 

DOI:10.1063/1.90473

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Data are presented showing that AlxGa1−xAs (x∼0.42) grown by metalorganic chemical vapor deposition (MO‐CVD) will operate as a photopumped laser to wavelengths as short as ∼6200 A˚ (77 °K). From the different spectral behavior of two separately photopumped epitaxial AlxGa1−xAs (x∼0.36) confining layers (1 and 0.3 &mgr;m thick) with an 80‐A˚ (and a comparison 200‐A˚) GaAs quantum‐well center layer, the recombination of hot electrons with holes collected in the quantum layer is used to estimate &Dgr;Ev.

 

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