Valence band discontinuity at the ZnTe/CdTe interface: Making ohmic contact toP‐type CdTe
作者:
David W. Niles,
Hartmut Ho¨chst,
Dennis Rioux,
期刊:
AIP Conference Proceedings
(AIP Available online 1992)
卷期:
Volume 268,
issue 1
页码: 279-284
ISSN:0094-243X
年代: 1992
DOI:10.1063/1.42930
出版商: AIP
数据来源: AIP
摘要:
We studied the growth and electronic structure of the ZnTe/CdTe(100) interface with angle‐resolved synchrotron radiation photoemission (ARPES) and reflection high energy electron diffraction (RHEED). RHEED patterns during the growth of ZnTe layers on the CdTe(100) substrate showed that the initial ∼16 A˚ grows in registry. After this pseudomorphic 16 A˚ layer, the next 120 A˚ grows with defects to relieve the 6.6% strain between ZnTe and CdTe. After ∼140 A˚, the ZnTe layers are relaxed. ARPES taken near the Brillouin zone center gave a valance band offset &Dgr;Ev=0.14 eV, with the ZnTe valence band maximum (VBM) higher than the CdTe VBM.
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