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Valence band discontinuity at the ZnTe/CdTe interface: Making ohmic contact toP‐type CdTe

 

作者: David W. Niles,   Hartmut Ho¨chst,   Dennis Rioux,  

 

期刊: AIP Conference Proceedings  (AIP Available online 1992)
卷期: Volume 268, issue 1  

页码: 279-284

 

ISSN:0094-243X

 

年代: 1992

 

DOI:10.1063/1.42930

 

出版商: AIP

 

数据来源: AIP

 

摘要:

We studied the growth and electronic structure of the ZnTe/CdTe(100) interface with angle‐resolved synchrotron radiation photoemission (ARPES) and reflection high energy electron diffraction (RHEED). RHEED patterns during the growth of ZnTe layers on the CdTe(100) substrate showed that the initial ∼16 A˚ grows in registry. After this pseudomorphic 16 A˚ layer, the next 120 A˚ grows with defects to relieve the 6.6% strain between ZnTe and CdTe. After ∼140 A˚, the ZnTe layers are relaxed. ARPES taken near the Brillouin zone center gave a valance band offset &Dgr;Ev=0.14 eV, with the ZnTe valence band maximum (VBM) higher than the CdTe VBM.

 

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