Model for Exposure of Electron-Sensitive Resists
作者:
J. S. Greeneich,
T. Van Duzer,
期刊:
Journal of Vacuum Science and Technology
(AIP Available online 1973)
卷期:
Volume 10,
issue 6
页码: 1056-1059
ISSN:0022-5355
年代: 1973
DOI:10.1116/1.1318466
出版商: American Vacuum Society
数据来源: AIP
摘要:
A mathematical model for the exposure of electron-sensitive resists on a structure coated with a thin layer of resist is presented. The calculations yield contours of equal absorbed energy density in the resist and these are interpreted as the contours which bound the resist after development. We calculate the exposure for an electron beam of vanishingly small cross-section, a beam of Gaussian current-density distribution, single lines, parallel lines, and areas.
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